Hello!Welcome to Shanghai Sheeny Metal Materials Co.,Ltd. Website! Hotline:+86-400-6632276
PRODUCTSPRODUCT SHOW

Our products and service are widely accepted and recognized by
clients worldwide including Korea, Japan, America, Europe and Middle East.

Gallium

Gallium Oxide

CAS #: 12024-21-4
Molecular Formula: Ga2O3
EC No.: 234-691-7

                
Contact us
Service Hotline+86-400-6632276

Product Details

Gallium oxide is an inorganic compound with the chemical formula Ga2O3. White triangular crystalline particles. Insoluble in water. Slightly soluble in hot acid or alkali solutions. Melting point: 1900℃(transforms into β form at 600℃). It is readily soluble in alkali metal hydroxides and dilute inorganic acids. There are two variants, α and β. The α type is a white rhombic hexahedron.

Applications:

  1. It is used as an activator in LED phosphors.

  2. It is used as raw material for special scintillation crystals or laser crystals.

Product Series

ProductProduct  CodeSecurity DataTechnical Data
Gallium Oxide 99.99%ET-Ga-01

Gallium(III) oxide.pdf

Gallium Oxide Ga2O3 99.99%.pdf

Gallium Oxide 99.999%ET-Ga-02

Gallium Oxide Ga2O3 99.999%.pdf


Properties (Theoretical)

Molecular FormulaGa2O3
Molecular Weight187.44
AppearanceWhite Powder
Melting Point1,900° C (3,452° F)
Boiling PointN/A
Density5.88 g/cm3
Precise Quality187.835  g/mol
Single Isotope Mass185.835906  Da


Health & Safety Information

Signal WordN/A
Risk StatementN/A
Dangerous CodeN/A
Preventive InstructionsN/A
Flash PointN/A
Risk CodeNot applicable
Safety StatementN/A
RTECS NumberN/A
Transportation InformationNONH
WGK Germany2


Packaging Specifications:

Standard packaging: 50 kg/drum, 500 kg/pallet, ton bags

Sample packaging: 500 g/bag, 1 kg/bottle



Gallium Oxide
About Lanthanum Metal

Gallium oxide is an oxide of the metal gallium and is also a semiconductor compound. Up to now, its crystalline forms have been confirmed to include five types: α, β, γ, δ and ε, among which the β structure is the most stable. Most of the research related to the crystalline growth and physical properties of gallium oxide focuses on the β structure. Researchers have attempted to fabricate metal-semiconductor field-effect transistors. Although they are of a simple structure without a protective or passivation film formed, the samples have already demonstrated the characteristics of high withstand voltage and low leakage current. When manufacturing components of the same structure using silicon carbide and gallium nitride, it is usually difficult to meet the indicators of these samples.

The mainstream methods for preparing gallium oxide: According to the different states of raw materials during the crystal growth process of β-Ga2O3, the crystal growth methods can be classified as: solution method, melt method, gas phase method, solid phase method, etc. The melt method is the earliest studied and most widely applied crystal growth method, and it is also the commonly used method for growing β-Ga2O3 bulk single crystals at present. High-quality and low-cost β-Ga2O3 bulk single crystals can be grown through the melt method. Among them, the two most commonly used growth methods mainly include the pulling method and the mold guiding method.